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GaN基光電材料外延與MOCVD反應(yīng)腔結(jié)構(gòu)關(guān)聯(lián)性研究Research on the Correlation Between GaN-based Optoelectronic Material Epitaxy and MOCVD Reactor Chamber Structure姚威振中國(guó)科學(xué)院半導(dǎo)體研究所副研究員、中科重儀半導(dǎo)體聯(lián)合創(chuàng)始人YAO WeizhenAssociate Professor of Institute of Semiconductors, Chinese Academy of Sciences, Co-founder of CASInstruments Semiconductor Co., Ltd.

硅襯底GaN基光電材料外延生長(zhǎng)Epitaxial Growth of GaN Based Photoelectric Materials on Silicon Substrate孫錢中國(guó)科學(xué)院蘇州納米技術(shù)與納米仿生研究所研究員SUN QianProfessorof Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences

35-5V單片集成GaN基DC-DC浮動(dòng)降壓轉(zhuǎn)換器A 35-5 V Monolithic integrated GaN-based DC-DC Floating Buck Converter朱昱豪西交利物浦大學(xué)ZHU YuhaoXi'an Jiaotong-Liverpool University

GaN基微腔激光器的制備Fabrication of GaN based micro-cavity lasers梅洋廈門大學(xué)助理教授MEI YangAssistant Professor of Xiamen University

AlGaN基低維量子結(jié)構(gòu)外延和電導(dǎo)率調(diào)控研究Study on the epitaxy and conductivity regulation of AlGaN based low dimensional quantum structures許福軍北京大學(xué)物理學(xué)院副教授Xu Fujun - Associate Professor, Peking University

垂直氮化鎵器件，尤其是硅襯底上，因其低成本襯底而引起了人們對(duì)大功率應(yīng)用的廣泛關(guān)注。但其性能仍低于氮化鎵襯底上的垂直氮化鎵器件。關(guān)鍵問題是在硅襯底上實(shí)現(xiàn)低位錯(cuò)密度和連續(xù)厚氮化鎵層具有挑戰(zhàn)性。會(huì)上，北京大學(xué)馮玉霞博士結(jié)合具體的研究實(shí)踐，分享了Si襯底上GaN基外延材料生長(zhǎng)及雜質(zhì)缺陷研究的成果，首次提供了在C摻雜半絕緣氮化鎵中取代C原子占據(jù)N位點(diǎn)的明確證據(jù)。